DescriptionRotated EUV illumination through slit.png
English: The EUV reticle illumination angles are rotated at different slit positions due to the arc-shaped slit used in EUV lithography tools, necessary for feasible image field corrections.[1][2][3][4][5][6][7][8][9][10] The reason for this is a mirror is used to transform straight rectangular fields into ring (arc-shaped) fields.[11] This is due to the off-vertical position of the point source (left),[12][13] which is actually a pupil position reflecting an arc-shaped image, such as light from an arc-shaped facet,[14][15] or other arc-shaped source (diverging beamlet).[16] In general,
light reflecting from a curved optical surface (such as the condenser) produces arc shapes.[17] Consequently, the angle-dependent and wavelength-dependent mask multilayer reflectance manifests as an effective illumination nonuniformity (shown here as the color gradient) across the pupil (right).[18]
↑H. N. Chapman and K. A. Nugent, Proc. SPIE 3767, 225 (1999).
↑N. Davydova et al., Proc. SPIE 8661, 866124 (2011).
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