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Description
English: SEM micrograph of a wide-bandgap semiconductor prepared for TEM by focused-ion-beam milling.
Deutsch: SEM-Bild eines Halbleiters der fuer Aufnahmen im TEM mit einer FIB praepariert wurde.
Date
Source English wikipedia
Author english User:Cm the p


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9 March 2006

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Date/TimeThumbnailDimensionsUserComment
current14:36, 3 February 2007Thumbnail for version as of 14:36, 3 February 20071,024 × 800 (205 KB)EdC{{Information |Description=SEM micrograph of a wide-bandgap semiconductor prepared for TEM by focused-ion-beam milling. |Source=English wikipedia |Date=9 March 2006 |Author=english User:Cm the p |Permission= |other_versions= }} [[category:Focused Ion Bea

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